教授
品川 啓介
シナガワ ケイスケ
学会発表 - 2016年度以前
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k.shinagawa et al. (2013)
The Impact of Science-Based Process Innovation on Blue LED Success
The 6th ISPIM Innovation Symposium, Melbourne, Australia
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k.shinagawa et al. (2012)
Science-based Process Technology Impact on Product Success; the LED Case
The 5th ISPIM Innovation Symposium, Seoul, Korea
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k.shinagawa et al. (2012)
The Role of a "Scientific Seed Theory" in Scientific Innovation
The 23th ISPIM Conference, Barcelona, Spain
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k.shinagawa et al. (2011)
The innovation process of dominant scientific theory: How does “an explosion of scientific knowledge” occur in studies on gallium nitride?
The 4th ISPIM Innovation Symposium Wellington, New Zealand
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k.shinagawa et al. (2010)
Radiation cooling effects on recent advanced electronic device performances with alumina
Renewable Energy 2010, Yokohama, Japan
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k.shinagawa et al. (2010)
How scientific knowledge influence the market growth; Study on the correlation between the MEMS study and market
International Conference on Electronics Packaging 2010, Sapporo, Japan, pp.646-651
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k.shinagawa et al. (2010)
Radiation cooling effects on recent advanced electronic device performances with alumina
International Conference on Electronics Packaging 2010 Sapporo, Japan, pp.760-765
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k.shinagawa et al. (2009)
Radiation cooling effects on recent advanced electronic device performances with alumina
24th European Photovoltaic Solar Energy Conference, Hamburg, Germany, pp.3581-3585
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品川啓介, 西村元延他 (2009)
高放射率を有するアルミナ筐体による高輝度白色LEDの温度上昇低減
平成21年度照明学会第42回全国大会講演論文集、pp.103-104
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k.shinagawa and M.Nishimura et al. (2009)
Radiation Cooling Effects on LSI Chip Temperature with an Alumina Heat Sink of High Infracted Emissivity Material
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K.Shinagwa, N.Nakamura and S.Fujimura (1992)
High ashing rate of ion implanted resist layer
14th Annual Symposium on Dry Process Tokyo, Japan, pp75-80
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K.Kondo, K.Shinagwa and S.Fujimura (1991)
Effects of H2O Downstream on After Corrosion
13th Annual Symposium on Dry Process, Tokyo, Japan, pp.117-122
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k.shinagawa (1990)
Effects of Plasma-Wafer Distance in O2+N2 Downstream Ashing
The 8th Symposium on Plasma Processing Montreal, Canada
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