福岡女子大学
福岡女子大学 地域連携センター
地域連携センター 女性生涯学習研究部門 研究支援部門 地域交流部門
研究者データベース
研究者 学会発表
品川 啓介
教授

品川 啓介

シナガワ ケイスケ

学会発表 - 2016年度以前

  • k.shinagawa et al. (2013) The Impact of Science-Based Process Innovation on Blue LED Success The 6th ISPIM Innovation Symposium, Melbourne, Australia
  • k.shinagawa et al. (2012) Science-based Process Technology Impact on Product Success; the LED Case The 5th ISPIM Innovation Symposium, Seoul, Korea
  • k.shinagawa et al. (2012) The Role of a "Scientific Seed Theory" in Scientific Innovation The 23th ISPIM Conference, Barcelona, Spain
  • k.shinagawa et al. (2011) The innovation process of dominant scientific theory: How does “an explosion of scientific knowledge” occur in studies on gallium nitride? The 4th ISPIM Innovation Symposium Wellington, New Zealand
  • k.shinagawa et al. (2010) Radiation cooling effects on recent advanced electronic device performances with alumina Renewable Energy 2010, Yokohama, Japan
  • k.shinagawa et al. (2010) How scientific knowledge influence the market growth; Study on the correlation between the MEMS study and market International Conference on Electronics Packaging 2010, Sapporo, Japan, pp.646-651
  • k.shinagawa et al. (2010) Radiation cooling effects on recent advanced electronic device performances with alumina International Conference on Electronics Packaging 2010 Sapporo, Japan, pp.760-765
  • k.shinagawa et al. (2009) Radiation cooling effects on recent advanced electronic device performances with alumina 24th European Photovoltaic Solar Energy Conference, Hamburg, Germany, pp.3581-3585
  • 品川啓介, 西村元延他 (2009) 高放射率を有するアルミナ筐体による高輝度白色LEDの温度上昇低減 平成21年度照明学会第42回全国大会講演論文集、pp.103-104
  • k.shinagawa and M.Nishimura et al. (2009) Radiation Cooling Effects on LSI Chip Temperature with an Alumina Heat Sink of High Infracted Emissivity Material
  • K.Shinagwa, N.Nakamura and S.Fujimura (1992) High ashing rate of ion implanted resist layer 14th Annual Symposium on Dry Process Tokyo, Japan, pp75-80
  • K.Kondo, K.Shinagwa and S.Fujimura (1991) Effects of H2O Downstream on After Corrosion 13th Annual Symposium on Dry Process, Tokyo, Japan, pp.117-122
  • k.shinagawa (1990) Effects of Plasma-Wafer Distance in O2+N2 Downstream Ashing The 8th Symposium on Plasma Processing Montreal, Canada

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